SU-8 protective layer in photo-resist patterning on As2S3...

physica status solidi (c) 2011 Vol. 8; Iss. 11-12

SU-8 protective layer in photo-resist patterning on As2S3 film

Duk-Yong Choi, Steve Madden, Douglas Bulla, Andrei Rode, Rongping Wang, Barry Luther-Davies
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Volume:
8
Year:
2011
Language:
english
Pages:
4
DOI:
10.1002/pssc.201000741
File:
PDF, 289 KB
english, 2011
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