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55 nm gate ion-implanted GaN-HEMTs on sapphire and Si substrates
Hideo Katayose, Masanao Ohta, Kazuki Nomoto, Norio Onojima, Tohru NakamuraVolume:
8
Year:
2011
Language:
english
Pages:
3
DOI:
10.1002/pssc.201001017
File:
PDF, 285 KB
english, 2011