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Surface chemistry of the preferred (111) and (220) crystal oriented microcrystalline Si films by radio-frequency plasma-enhanced chemical vapor deposition
Daisuke Ohba, Hideto Koshino, Zeguo Tang, Hajime ShiraiVolume:
8
Year:
2011
Language:
english
Pages:
4
DOI:
10.1002/pssc.201001111
File:
PDF, 472 KB
english, 2011