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[IEEE 2006 International SiGe Technology and Device Meeting - Princeton, NJ, USA (15-17 May 2006)] 2006 International SiGe Technology and Device Meeting - Formation of High Quality Strained-Si / Strained-SiGe Layers Grown on Relaxed SiGe Virtual Substrates for Advanced CMOS Application
In-kyum Kim,, Suk-june Kang,, Hyung-sang Yuk,, Dong-kun Lee,, Bo-young Lee,Year:
2006
Language:
english
DOI:
10.1109/istdm.2006.1662595
File:
PDF, 1.51 MB
english, 2006