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[IEEE 2006 International SiGe Technology and Device Meeting - Princeton, NJ, USA (15-17 May 2006)] 2006 International SiGe Technology and Device Meeting - Xenon Difluoride Dry Etching of Si, SiGe Alloy and Ge
Guangchi Xuan,, Adam, T.N., Suehle, J., Fitzgerald, E., Lv, P., Sustersic, N., Coppinger, M.J., Kolodzey, J.Year:
2006
Language:
english
DOI:
10.1109/istdm.2006.1662610
File:
PDF, 1.53 MB
english, 2006