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Silicon nitride thickness profile tuning to reduce shallow trench isolation variability in planar CMOS
Rajachidambaram, Jaana, Gumpher, John, Sharma, Vineet, Tsao, Chia Hao, Yatzor, BrettYear:
2016
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2016.2558460
File:
PDF, 497 KB
english, 2016