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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Liquid phase silylation process for 248-nm lithography using EL IR photoresist
Zhang, Guojing, Smith, Bruce W., Fuller, Lynn F., Nalamasu, OmkaramVolume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175365
File:
PDF, 315 KB
english, 1994