SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Phase preservation study on ArF mask for haze-free mask resist strip and cleaning
Shi, Irene, Guo, Eric, Tian, Eric, Gu, Tracy, Jiang, Forrest, Qian, Sandy, Matsushima, Daisuke, Pang, Jinyuan, Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2023019
File:
PDF, 511 KB
english, 2013