SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - SRAF window improvement with under-coating layer
Wallow, Thomas I., Hohle, Christoph K., Hiromatsu, Takahiro, Fukui, Toru, Tsukagoshi, Kenta, Ono, Kazunori, Hashimoto, MasahiroVolume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2046779
File:
PDF, 6.09 MB
english, 2014