SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V - Resolution and components of critical dimension variation in x-ray lithography
Early, Kathleen, Trindade, David, Leonard, Quinn J., Cerrina, Franco, Simon, Klaus, McCord, Mark A., DeMay, Daniel J., Warlaumont, John M.Volume:
2437
Year:
1995
Language:
english
DOI:
10.1117/12.209183
File:
PDF, 1.06 MB
english, 1995