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SPIE Proceedings [SPIE Photomask Japan 1995 - Kanagawa, Japan (Thursday 20 April 1995)] Photomask and X-Ray Mask Technology II - Application of phase-shift mask to GaAs IC fabrication process
Kojima, Yoshiki, Nakatani, Mitsunori, Nakano, Hirofumi, Kamon, Kazuya, Sato, Kazuhiko, Yoshihara, HideoVolume:
2512
Year:
1995
Language:
english
DOI:
10.1117/12.212786
File:
PDF, 490 KB
english, 1995