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SPIE Proceedings [SPIE Photomask Japan 2016 - Yokohama, Japan (Wednesday 6 April 2016)] Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology - Etched multilayer EUV mask fabrication for sub-60nm pattern based on effective mirror width
Yoshioka, Nobuyuki, Iida nee Sakurai, Noriko, Takai, Kosuke, Kamo, Takashi, Morikawa, Yasutaka, Hayashi, NaoyaVolume:
9984
Year:
2016
Language:
english
DOI:
10.1117/12.2242872
File:
PDF, 2.47 MB
english, 2016