SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Focus and exposure dose determination using stepper alignment
Dirksen, Peter, Pellens, Rudy J. M., Juffermans, Casper A. H., Reuhman-Huisken, Marijan E., van der Laan, Hans, Fuller, Gene E.Volume:
2726
Year:
1996
Language:
english
DOI:
10.1117/12.240941
File:
PDF, 415 KB
english, 1996