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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Laser removal of deep submicron-patterned photoresist after RIE of polysilicon, contacts, and vias
Genut, Menachem, Tehar-Zahav, Ofer, Iskevitch, Eli, Livshits, Boris, Tarascon-Auriol, Regine G.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275872
File:
PDF, 476 KB
english, 1997