![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Precise measurement of ARC optical indices in the deep-UV range by variable-angle spectroscopic ellipsometry
Boher, Pierre, Stehle, Jean-Louis P., Piel, Jean-Philippe, Defranoux, Christophe, Hennet, Louis, Jones, Susan K.Volume:
3050
Year:
1997
Language:
english
DOI:
10.1117/12.275961
File:
PDF, 1.07 MB
english, 1997