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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Effects of excimer laser radiation on attenuated phase-shift masking materials
Smith, Bruce W., Zavyalova, Lena, Butt, Shahid A., Bourov, Anatoly, Bergman, Nathan, Fonseca, Carlos A., Alam, Zulfiquar, Fuller, Gene E.Volume:
3051
Year:
1997
Language:
english
DOI:
10.1117/12.276051
File:
PDF, 685 KB
english, 1997