![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication
Brooks, Cameron J., Benoit, Douglas E., Racette, Kenneth C., Puisto, Denise M., Whig, Renu, Dauksher, William J., Cummings, Kevin D., Vladimirsky, YuliVolume:
3331
Year:
1998
Language:
english
DOI:
10.1117/12.309578
File:
PDF, 1.67 MB
english, 1998