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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Lithographic effects of mask critical dimension error
Wong, Alfred K. K., Ferguson, Richard A., Liebmann, Lars W., Mansfield, Scott M., Molless, Antoinette F., Neisser, Mark O., Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310718
File:
PDF, 988 KB
english, 1998