SPIE Proceedings [SPIE Design, Test, and Microfabrication of MEMS/MOEMS - Paris, France (Tuesday 30 March 1999)] Design, Test, and Microfabrication of MEMS and MOEMS - Characteristics of residual products in HF gas-phase etching of sacrificial oxides for silicon micromachining
Jang, Won-Ick, Choi, Chang-Auck, Lee, Chang S., Hong, Yoonshik, Lee, Jong-Hyun, Courtois, Bernard, Crary, Selden B., Ehrfeld, Wolfgang, Fujita, Hiroyuki, Karam, Jean Michel, Markus, Karen W.Volume:
3680
Year:
1999
Language:
english
DOI:
10.1117/12.341163
File:
PDF, 1.67 MB
english, 1999