SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Chemically amplified negative-tone resist using novel acryl polymer for 193-nm lithography
Hada, Hideo, Iwai, Takeshi, Nakayama, Toshimasa, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350254
File:
PDF, 1.65 MB
english, 1999