SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Computation of reflected images from extreme ultraviolet masks
Bollepalli, Srinivas B., Cerrina, Franco, Vladimirsky, YuliVolume:
3676
Year:
1999
Language:
english
DOI:
10.1117/12.351132
File:
PDF, 1.97 MB
english, 1999