![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - CD uniformity consideration for DUV step and scan tools
Seltmann, Rolf, Minvielle, Anna Maria, Spence, Chris A., Muehle, Sven, Capodieci, Luigi, Nguyen, Khanh B., Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354337
File:
PDF, 1.81 MB
english, 1999