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SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Resolution enhancement with high-transmission attenuating phase-shift masks
Socha, Robert J., Conley, Will, Shi, Xuelong, Dusa, Mircea V., Petersen, John S., Chen, J. Fung, Wampler, Kurt E., Laidig, Thomas L., Caldwell, Roger F., Morimoto, HiroakiVolume:
3748
Year:
1999
Language:
english
DOI:
10.1117/12.360236
File:
PDF, 3.96 MB
english, 1999