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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Soft bake effect in 193-nm chemically amplified resist
Sung, Moon-Gyu, Lee, Young-Mi, Lee, Eun-Mi, Sohn, Young-Soo, An, Ilsin, Oh, Hye-Keun, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388270
File:
PDF, 284 KB
english, 2000