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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Gel layer model for photoresist development
Cho, Joon Yeon, Choi, Se-Jin, Kim, Byung-Uk, Park, Jung-Moon, Lee, Seung J., Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388327
File:
PDF, 362 KB
english, 2000