SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara,...

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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Pattern asymmetry correction using assist patterns

Ryoo, Manhyoung, Nam, Dongseok, Cho, Hanku, Moon, Joo-Tae, Lee, Sangin, Progler, Christopher J.
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Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.389019
File:
PDF, 1.08 MB
english, 2000
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