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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Data of scattered electron characteristics in 100-kV EB stepper
Morita, Kenji, Yahiro, Takehisa, Shimizu, Sumito, Yamamoto, Hajime, Hirayanagi, Noriyuki, Fujiwara, Tomoharu, Suzuki, Syouhei, Shimizu, Hiroyasu, Kawata, Shintaro, Okino, Teruaki, Suzuki, Kazuaki, DobVolume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390111
File:
PDF, 2.27 MB
english, 2000