SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Critical defects in x-ray masks for 100-nm patterns
Watanabe, Hiroshi, Matsui, Yasuji, Morimoto, HiroakiVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392051
File:
PDF, 1009 KB
english, 2000