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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - CrOxFy as a material for attenuated phase-shift masks in ArF lithography
Nakazawa, Keisuke, Matsuo, Takahiro, Onodera, Toshio, Morimoto, Hiroaki, Mohri, Hiroshi, Hatsuta, Chiaki, Hayashi, Naoya, Morimoto, HiroakiVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392100
File:
PDF, 653 KB
english, 2000