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SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - High-resolution proximity printing by wave-optically designed complex transmission masks
Buehling, Sven, Wyrowski, Frank, Kley, Ernst-Bernhard, Nellissen, Ton J., Wang, Lingli, Dirkzwager, Maarten, Mack, Chris A., Stevenson, TomVolume:
4404
Year:
2001
Language:
english
DOI:
10.1117/12.425209
File:
PDF, 1.05 MB
english, 2001