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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - CD control for two-dimensional features in future technology nodes
Verhaegen, Staf, Gordon, Ronald L., Jonckheere, Rik M., McCallum, Martin, Ronse, Kurt G., Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435736
File:
PDF, 264 KB
english, 2001