SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process
Koh, Cha-Won, Jung, Jae Chang, Kim, Myoung-Soo, Kong, Keun-Kyu, Lee, Geunsu, Jung, Min-Ho, Kim, Jin-Soo, Shin, Ki-Soo, Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436911
File:
PDF, 303 KB
english, 2001