SPIE Proceedings [SPIE Photomask and Next Generation...

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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Improvement of NLD mask dry etching system

Fujisawa, Tatsuya, Yoshioka, Nobuyuki, Sasaki, Takaei, Yamashiro, Kazuhide, Kawahira, Hiroichi
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Volume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438356
File:
PDF, 1.23 MB
english, 2001
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