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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - New NIST Photomask Linewidth Standard
Potzick, James E., Pedulla, J. Marc, Stocker, Michael T., Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.467432
File:
PDF, 160 KB
english, 2002