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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Improved method for measuring and assessing reticle pinhole defects for the 100-nm lithography node
Taylor, Darren, Vacca, Anthony, Zurbrick, Larry S., Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476917
File:
PDF, 769 KB
english, 2002