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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Process of manufacturing and inspection of high-end (ternary) tritone EAPSM reticles for 0.13-μm design rule generation
Tuan, Steve, Gottlib, Gidon, Rosenbusch, Anja, Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476924
File:
PDF, 345 KB
english, 2002