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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Spectroscopic Ellipsometry based Scatterometry enabling 193nm Litho and Etch process control for the 110nm technology node and beyond
Hingst, Thomas, Marschner, Thomas, Moert, Manfred, Homilius, Jan, Guevremont, Marco, Hopkins, John, Elazami, Assim, Herr, Daniel J.Volume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.485011
File:
PDF, 331 KB
english, 2003