![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration
Herisson, David, Neira, DaniEle, Fernand, Cyril, Thony, Philippe, Henry, Daniel, Kremer, Stephanie, Polli, Marco, Guevremont, Marco, Elazami, Assim, Herr, Daniel J.Volume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.485031
File:
PDF, 729 KB
english, 2003