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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Glass transition temperature studies in thin photoresist films with an interferometric method
Niakoula, Dimitra, Raptis, Ioannis, Bellas, Vasilios, Argitis, Panagiotis, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485072
File:
PDF, 261 KB
english, 2003