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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Bilayer technology for ArF and F2 lithography: the development of resists to minimize silicon outgassing
Barclay, George G., Kanagasabapathy, Subbareddy, Pohlers, Gerd, Mattia, Joseph, Xiong, Kao, Ablaza, Sheri L., Cameron, James F., Zampini, Tony, Zhang, Tao, Yamada, Shintaro, Huby, Francois, Wiley, KenVolume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485141
File:
PDF, 931 KB
english, 2003