SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Extending ArF to the 65-nm node with full-phase lithography
Driessen, Frank A., Pierrat, Christophe, Vandenberghe, Geert, Ronse, Kurt G., van Adrichem, Paul, Liu, Hua-Yu, Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485426
File:
PDF, 3.25 MB
english, 2003