SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Defect repair performance using the nanomachining repair technique
Morikawa, Yasutaka, Tanabe, Hiroyoshi, Kokubo, Haruo, Nishiguchi, Masaharu, Hayashi, Naoya, White, Roy, Bozak, Ron, Terrill, LeeVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504213
File:
PDF, 967 KB
english, 2003