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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Impact of resist blur on MEF, OPC, and CD control
Brunner, Timothy A., Smith, Bruce W., Fonseca, Carlos, Seong, Nakgeuon, Burkhardt, MartinVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.537472
File:
PDF, 225 KB
english, 2004