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SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Silylation processes for 193-nm lithography using acid-catalyzed resists
Hartney, Mark A., Thackeray, James W., Novembre, Anthony E.Volume:
1672
Year:
1992
Language:
english
DOI:
10.1117/12.59768
File:
PDF, 452 KB
english, 1992