SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Data Analysis and Modeling for Process Control II - Advanced process control for deep sub-100nm gate fabrication
Goto, Takeshi K., Emami, Iraj, Tajima, Mitsugu, Harada, Fukashi, Kato, Takaya, Yamazaki, Takahiro, Taguchi, TakaoVolume:
5755
Year:
2005
Language:
english
DOI:
10.1117/12.599284
File:
PDF, 307 KB
english, 2005