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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Photomask etch and profile control of 65nm chromeless phase lithography masks using scanning probe metrology
Anderson, Scott A., Komuro, Masanori, Buxbaum, Alex, Kumar, Ajay, Ibrahim, IbrahimVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617206
File:
PDF, 419 KB
english, 2005