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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - EUV lithography simulation for the 32nm node
Kim, Eun Jin, Lercel, Michael J., Chang, Wook, Park, Jin Back, Kim, Sung Jin, Kim, Jong Sun, Oh, Hye-KeunVolume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.656335
File:
PDF, 821 KB
english, 2006