SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - High NA polarized light lithography for 0.29k1 process
Park, Chanha, Flagello, Donis G., Lee, Jeonkyu, Yang, Kiho, Tseng, Shih-en, Min, Young-Hong, C., Alek, Yang, Hyunjo, Yim, Donggyu, Kim, JinwoongVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656841
File:
PDF, 2.04 MB
english, 2006