SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - MEEF-based correction to achieve OPC convergence of low-k1 lithography with strong OAI
Choi, Soo-Han, Flagello, Donis G., Je, A-Young, Hong, Ji-Suk, Yoo, Moon-Hyun, Kong, Jeong-TaekVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656894
File:
PDF, 646 KB
english, 2006