SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Exposure and compositional factors that influence polarization induced birefringence in silica glass
Allan, Douglas C., Flagello, Donis G., Mlejnek, Michal, Neukirch, Ulrich, Smith, Charlene M., Smith, Frances M.Volume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.712125
File:
PDF, 569 KB
english, 2007